Physical Science International Journal, ISSN: 2348-0130,Vol.: 4, Issue.: 8 (October)
The Magnetized Plasma Effect on Cathode Fall Thickness for Helium Gas Discharge
Ahmed Rida Galaly1,2* 1Engineering Science Department, Faculty of Community, Umm Al-Qura University-Makkah, P.O. Box (715), Saudi Arabia.
2Department of Physics, Faculty of Science, Beni-Suef University, Egypt.
Ahmed Rida Galaly1,2*
1Engineering Science Department, Faculty of Community, Umm Al-Qura University-Makkah, P.O. Box (715), Saudi Arabia.
(1) Tienfuan Kerh, National Pingtung University of Science and Technology, Taiwan.
(2) Stefano Moretti, School of Physics & Astronomy, University of Southampton, UK.
Complete Peer review History:http://www.sciencedomain.org/review-history/5041
Our previous study showed that the thickness of the cathode fall region in magnetized DC argon plasma was about 3.3mm has been investigated using two different methods, namely: the axial potential distribution and the current density distribution along the glow discharge regions. The present study demonstrates the same measurements but carried out for Helium gas discharge at the edge and center of the cathode surface for the same characteristic of the DC (cold cathode) magnetron sputtering unit. The Ia–Va characteristic curves of the glow discharge and the axial potential distribution and the current density distribution have been investigated. Under the influence of magnetic field, the thickness of the cathode fall region for he discharge is about 2.5mm for the two methods in pressure (P) range of 1-4mbar. Apparently for helium gas discharge, a reduction of the cathode fall thickness (about 20%) has been found in the presence of a magnetic field at the center of the cathode and (about 37%) at the edge, furthermore stronger electric field at the edge of the cathode fall, and hence high rates of sputtering are expected.
DC glow discharge; cathode fall thickness; helium gas discharge; magnetic field PACS number; 52.25.Xz.
Full Article - PDF Page 1088-1099
DOI : 10.9734/PSIJ/2014/9605Review History Comments